Saravanan, G. and Mohan, S. (2009) Pulsed electrodeposition of microcrystalline chromium from trivalent Cr-DMF bath. Journal of Applied Electrochemistry, 39 (8). pp. 1393-1397. ISSN 0021-891X

PDF Restricted to Registered users only Download (299Kb) | Request a copy

Abstract

Pulsed electrodeposition (PED) with square wave has successfully been applied to deposit microcrystalline chromium from Cr-dimethylformamide (DMF) bath. The influence of the duty cycle, on-time, off-time, frequency, and pulse peak current on thickness, current efficiency, and hardness were investigated. Based on the analysis of the microstructure, the corrosion behavior of both directcurrent deposited (DCD) and pulse-current deposited (PED) chromiumin 3.5% NaCl solution was studied using potentiodynamic polarization and electrochemical impedance spectroscopy (EIS). The results indicated that both pulsed electrodeposits and direct-current deposits have high charge transfer resistance Rct and very low Icorr compared with mildsteel substrate.

Item Type:	Article
Uncontrolled Keywords:	Trivalent chromium; Chromium; electrodeposition; Duty cycle; Coatings; Electrochemical impedance spectroscopy (EIS); Porosit
Subjects:	Industrial Metal Finishing
Divisions:	UNSPECIFIED
Depositing User:	TTBD CECRI
Date Deposited:	02 Apr 2012 06:03
Last Modified:	02 Apr 2012 06:03
URI:	http://cecri.csircentral.net/id/eprint/397

Actions (login required)

View Item