Saravanan, G. and Mohan, S. (2010) Structure, current efficiency, and corrosion properties of brush electrodeposited (BED) Cr from Cr(III)dimethyl formamide (DMF)-bath. Journal of Applied Electrochemistry, 40. pp. 1-6. ISSN 0021-891X
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Abstract
Chromium electrodeposited from Cr(III)dimethyl formamide-bath was studied using brush electrodeposition (BED) technique. The effects of current density and plating time on thickness and current efficiency were studied. An advantage of BED Cr was to produce selective area deposition on a suitable substrate. Chromium deposits were characterized using XRD, SEM, and AFM. From the electrochemical studies, BED Cr have higher charge transfer resistance Rct and very low Icorr than that of mild steel substrate.
Item Type: | Article |
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Uncontrolled Keywords: | Brush electrodeposition; Cr coatings; Dimethylformamide; Metal coatings; Electrochemical impedance spectroscopy (EIS); Electrodeposited film Passivity |
Subjects: | Industrial Metal Finishing |
Divisions: | UNSPECIFIED |
Depositing User: | ttbdar CECRI |
Date Deposited: | 08 May 2012 07:10 |
Last Modified: | 08 May 2012 07:10 |
URI: | http://cecri.csircentral.net/id/eprint/297 |
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