Josephkennedy, C. and Aruna, A. and Krishnan, R.M. and Sobha , J. and Sriveeraraghavan, S. and Natarajan, S.R. (1996) Influence of potassium iodate on chromium deposition. Bulletin of Electrochemistry, 12 (5-6). pp. 283-287. ISSN 0256-1654

Preview

PDF Download (1057Kb) | Preview

Abstract

Chromium plating finds not only decorative but also functional applications. Generaly chromium deposits are obtained from electrolytes with an approximate ratio of 100:1 of chromic acid to sulphuric acid. The self regulating high speed chromium plating electrolytes, which are often employed for hard chromium plating though of higher efficiency have the disadvantages of cathodic etching and higher corrosivity. These are mainly due to the presence of fluorine compound as a bath constituent. In this paper we report the result of experiments carried out with non etching electrolytes but containing sulphate and potassium iodate. Different concentration of chromic acid, sulphate and potassium iodate were used and current efficiency, rate of build up, throwing power, deposit nature and microhardness were evaluated.

Item Type:	Article
Uncontrolled Keywords:	Chromium plating; low concentration; KIO3 and HENE
Subjects:	Industrial Metal Finishing
Divisions:	UNSPECIFIED
Depositing User:	ttbdar CECRI
Date Deposited:	23 May 2012 09:20
Last Modified:	23 May 2012 09:20
URI:	http://cecri.csircentral.net/id/eprint/2713

Actions (login required)

View Item