Subramanian, B. and Ashok, K. and Kuppusami, P. and Sanjeeviraja, C. and Jayachandran, M. (2008) Characterization of reactive DC magnetron sputtered TiAlN thin films. Cryst. Res. Technol., 43 (10). pp. 1078-1082.

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Abstract

Thin films of about 1μm Titanium Aluminum Nitride (TiAlN) were deposited onto mild steel substrates by reactive direct current (DC) magnetron sputtering using a target consisting of equal segments of titanium and aluminum. X-ray diffraction (XRD) analysis showed that the TiAlN phase had preferred orientations along 111 and 200 with the face-centered cubic structure. Scanning Electron Microscope (SEM) and Atomic Force Microscope (AFM) analyses indicated that the films were uniform and compact. Photoluminescence (PL) spectra reveal that TiAlN thin films are of good optical quality. Laser Raman studies revealed the presence of characteristic peaks of TiAlN at 312.5, 675, and 1187.5 cm–1.

Item Type:	Article
Uncontrolled Keywords:	thin films; reactive sputtering; XRD
Subjects:	Electrochemical Materials Science
Divisions:	UNSPECIFIED
Depositing User:	ttbdu cecri
Date Deposited:	16 Jan 2012 09:51
Last Modified:	16 Jan 2012 09:51
URI:	http://cecri.csircentral.net/id/eprint/74

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