Sivakumar, R. and Sanjeeviraja, C. and Jayachandran, M. and Gopalakrishnan, R. and Sarangi, S.N. and Paramanik, D. and Som, T. (2007) MeV N+-ion irradiation effects on -MoO3 thin films. Journal Of Applied Physics, 101. ISSN 0021-8979
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Abstract
In this work, modifications in the structural, vibrational, optical, and surface morphological properties of 2 MeV N+-ion irradiated -MoO3 thin films are studied. Nitrogen irradiation up to the fluence of 11015 ions cm−2 does not lead to any structural phase change. The irradiation induced formation of nanoscale defect structures at the film surface becomes more prominent at higher irradiation fluences, leading to the enhancement in the optical absorption behavior of the irradiated films. The possible role of energy loss process in the mechanism of modifying the surface morphology has been discussed.
Item Type: | Article |
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Subjects: | Electrochemical Materials Science |
Divisions: | UNSPECIFIED |
Depositing User: | ttbdar CECRI |
Date Deposited: | 28 Feb 2012 16:35 |
Last Modified: | 28 Feb 2012 16:35 |
URI: | http://cecri.csircentral.net/id/eprint/733 |
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