Subramanian, B. and Jayachandran, M. (2007) Characterization of reactive magnetron sputtered nanocrystalline titanium nitride (TiN) thin films with brush plated Ni interlayer. Journal of Applied Electrochemistry, 37. pp. 1069-1075. ISSN 0021-891X

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Abstract

Thin nanocrystalline Titanium nitride (TiN) films were deposited on mild steel (MS) substrates using reactive direct current magnetron sputtering. With the aim of improving the corrosion resistance an additional Nickel interlayer of about 5 lm thick was brush plated on to the steel substrates. X-ray diffraction analysis showed the polycrystalline nature of the sputtered TiN films. SEM analysis showed uniform surface morphology with dense columnar structure. Laser Raman spectroscopy revealed the presence of characteristic peaks of TiN at 320, 440 and 570 cm–1. The optical quality of the film was confirmed from the photoluminescence (PL) spectrum recorded at room temperature. The corrosion behavior of the coatings in 3.5% NaCl solution was studied using electrochemical techniques.

Item Type:	Article
Uncontrolled Keywords:	Corrosion resistance; Magnetron sputtering; PVD; Thin Films; Titanium Nitride
Subjects:	Electrochemical Materials Science
Divisions:	UNSPECIFIED
Depositing User:	ttbdar CECRI
Date Deposited:	26 Mar 2012 10:55
Last Modified:	26 Mar 2012 10:55
URI:	http://cecri.csircentral.net/id/eprint/710

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