Chockalingam, S.C. and Prabhakarrethinaraj, J. and Kulandaisamy, S. and Visvanathan, S.
(1996)
Performance characteristics of different anode systems in EMD deposition.
Bulletin of Electrochemistry, 12 (05).
pp. 329-332.
ISSN 0256-1654
Abstract
A comparison has been made of the behavior of variety of pretreated/activated anodes, viz., Ti, expanded Ti, Ti/RuO2-TiO2, Ti/MnO2, expanded Ti/MnO2 during deposition of EMD from sulphate and chloride electrolyte and compared with that of conventional ones, i.e., graphite, bare Ti and platinum with special reference to energy consumption and cell voltage. It is found that cell voltage increases with increase in sulphuric acid concentration in the bath, indicating passivation of the substrate. Ti/RuO2-TiO2 anode exhibits a lower cell voltage than bare Ti or Ti/MnO2 due to lower contact drop between the deposit and the substrate. The employment of expanded Ti/MnO2 exhibits a cell voltage comparable to that of Ti/RuO2-TiO2. In chloride electrolytes, in general Ti/RuO2-TiO2 behaves similar to Ti/MnO2 except that it exhibits a lower cell voltage by about 400-500 mV. Smooth platinum performs poorly due to lower overpotential for chloride evolution. Chemical manganese dioxide coated anode is more attractive for employment as anode for MnO2 deposition from either electrolyte
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