Subramanian, B. and Jayachandran, M. (2008) Materials properties of nanostructured titanium nitride thin films synthesised by DC reactive magnetron sputtering. Transactions of the Institute of Metal Finishing, 86 (1). pp. 62-65. ISSN 0020-2967

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Abstract

Titanium nitride (TiN) films were deposited on different substrates by reactive magnetron sputtering. X-ray diffraction analysis showed a preferential orientation along (111) and (200) for the sputtered TiN films on Si wafer. These films had a maximum reflectance of about 60% at 850 nm and local minimum reflectance at a wavelength of 480 nm. The good optical quality of the film was confirmed from the room temperature photoluminescence spectrum. The electrical resistivity was found to be 20 mV cm. Scanning electron microscopy analysis indicated that the coatings are very regular with dense columnar structure. Surface topography was examined by atomic force microscopy. Laser Raman studies showed characteristic peaks were observed at 315 and 560 cm–1.

Item Type:	Article
Uncontrolled Keywords:	Titanium nitride films; Magnetron sputtering; PVD
Subjects:	Electrochemical Materials Science
Divisions:	UNSPECIFIED
Depositing User:	ttbdu cecri
Date Deposited:	31 Mar 2012 11:04
Last Modified:	31 Mar 2012 11:05
URI:	http://cecri.csircentral.net/id/eprint/480

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