Subramanian, B. and Ashok, K. and Jayachandran, M. (2008) Effect of substrate temperature on the structural properties of magnetron sputtered titanium nitride thin films with brush plated nickel interlayer on mild steel. Applied Surface Science, 255 (5). pp. 2133-2138.

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Abstract

Thin films of titanium nitride (TiN) were prepared on mild steel (MS) by a physical vapor deposition (PVD) method namely direct current reactivemagnetron sputtering. With the aim of improving the adhesion of TiN layer an additional Nickel interlayer was brush plated on the steel substrates prior to TiN film formation. The phase has been identified with X-ray diffraction (XRD) analysis, and the results show that the prominent peaks observed in the diffraction patterns correspond to the (1 1 1), (2 0 0) and (2 2 2) planes of TiN. Cross-sectional SEM indicated the presence of dense columnar structure. The mechanical properties (modulus and hardness) of these films were characterized by nanoindentation.

Item Type:	Article
Uncontrolled Keywords:	Titanium nitride; Magnetron sputtering; Structural properties; Hard coatings
Subjects:	Electrochemical Materials Science
Divisions:	UNSPECIFIED
Depositing User:	ttbdu cecri
Date Deposited:	13 Jan 2012 10:30
Last Modified:	13 Jan 2012 10:30
URI:	http://cecri.csircentral.net/id/eprint/4

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