Sivakumar, R. and Sanjeeviraja, C. and Jayachandran, M. and Gopalakrishnan, R. and Sarangi, S.N. and Paramanik, D. and Som, T. (2008) High temperature grown transition metal oxide thin films: tuning physical properties by MeV N+-ion bombardment. Journal of Physics D: Applied Physics, 41 (12). ISSN 0022-3727

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Abstract

In this paper, we present a systematic study on tuning the physical properties of high temperature (373 K) grown transition metal oxide thin films by the effect of 2MeV nitrogen ion irradiation. Although we observe irradiation induced growth in crystallite sizes for both WO3 and MoO3 films, no structural phase change takes place in the films due to N+-ion beam irradiation even up to the fluence of 1 × 1015 N+ cm−2. On the other hand, irradiation leads to a significant increase in the optical absorption and the surface roughness of the films. These observations are corroborated by micro-Raman analysis. The results are attributed to the MeV ion–matter interaction.

Item Type:	Article
Subjects:	Electrochemical Materials Science
Divisions:	UNSPECIFIED
Depositing User:	ttbdu cecri
Date Deposited:	23 Jan 2012 03:56
Last Modified:	23 Jan 2012 03:56
URI:	http://cecri.csircentral.net/id/eprint/370

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