Murali, K.R. and Kumaresan, S. (2009) Characteristics of brush plated ZnS films. Chalcogenide Letters, 6 (1). pp. 17-22. ISSN 1584-8663
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Abstract
Zinc sulphide(ZnS) thin films were deposited by the brush electrodeposition technique at 80°C and at different deposition current densities in the range of 80 – 200 mA cm-2.The films were polycrystalline with peaks corresponding to single phase cubic ZnS. Films with direct band gap in the range of 3.79–3.93 eV were obtained. The grain size increased from 20 – 70 nm as the deposition current density increased. The films exhibited resistivity in the range of 100 – 1000 ohm cm. The photooutput obtained with photoelectrochemical cells employing these films was higher than the previous report.
Item Type: | Article |
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Uncontrolled Keywords: | ZnS; thin films; II-VI; brush electrodeposition |
Subjects: | Electrochemical Materials Science |
Divisions: | UNSPECIFIED |
Depositing User: | TTBD CECRI |
Date Deposited: | 18 Jan 2012 08:24 |
Last Modified: | 18 Jan 2012 08:24 |
URI: | http://cecri.csircentral.net/id/eprint/285 |
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