Ravi, R. and Jayachandran, M. and Chockalingam, M.J. (1990) Computer simulation of deposition behavior of CdTe films. Bulletin of Electrochemistry, 06 (05). pp. 534-535. ISSN 0256-1654

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Abstract

A computer program has been developed in Fortran to simulate the voltammetric curves to fix the best conditions for the deposition of n- or p- type CdTe films. It is observed that pH, temperature and Cd2+ ions and potential variations influence the deposition and nature of the films

Item Type:	Article
Uncontrolled Keywords:	CdTe films; Electrodeposition; Computer simulation
Subjects:	Electrochemical Materials Science
Divisions:	UNSPECIFIED
Depositing User:	ttbdu cecri
Date Deposited:	23 May 2012 09:17
Last Modified:	23 May 2012 09:17
URI:	http://cecri.csircentral.net/id/eprint/2700

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