Sathiyanarayanan, S. and Rajagopal, G. and Palaniswamy, N. and Raghavan, M. (2005) Corrosion protection by chemical vapor deposition: A review. Corrosion Reviews, 23 (4-6). pp. 355-370.

Preview

PDF - Accepted Version Download (497Kb) | Preview

Abstract

Material degradation through corrosion is a major threat to any process industry. The losses due to corrosion can be either direct or indirect. Combating this problem by engineering the surfaces is the economically viable solution. Chemical Vapor Deposition is the modem technology whereby the condensation of the solid material takes place from the vapor phase at a higher temperature. CVD finds extensive applications in optical, ceramic, electronic and allied industries. The possibility of controlling the deposition composition, microstructure, and making tailor-made coatings for specific applications has made CVD more user-friendly. This review briefly reviews the thermodynamics, kinetics, design and technological aspects of Chemical Vapor Deposition, and also summarizes its potential use for surface engineering for corrosion and wear protection.

Item Type:	Article
Uncontrolled Keywords:	Corrosion protection; chemical vapor deposition
Subjects:	Corrosion Protection Corrosion Science and Engineering Electrochemical Materials Science
Divisions:	UNSPECIFIED
Depositing User:	TTBD CECRI
Date Deposited:	14 Jan 2012 02:50
Last Modified:	14 Jan 2012 02:50
URI:	http://cecri.csircentral.net/id/eprint/24

Actions (login required)

View Item