Noel, M. and Santhanam, R. and Chidambaram, S. (1999) The influence of monovalent cations on the stability of electrochemically formed nickel fluoride ®lms. Journal of Solid State Electrochemistry, 3. pp. 239-244. ISSN 1432-8488

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The stability of electrochemically formed NiF2 film in 1.0 M perchloric acid containing monovalent fluorides namely, NH4F, HF, NaF, KF and LiF, is investigated using cyclic voltammetry, chronoampe- rometry, atomic absorption spectroscopy and scanning electron microscopy. In addition to direct dissolution of nickel and dissolution through the oxide layer, a new mode of dissolution of NiF2 film as NiFÿ 3 and NiF2ÿ 4 through complex formation is proposed. This process is significantly influenced by the alkali metal ¯uorides. On a comparative basis the stability of NiF2 decreases in the order NH4F > HF > KF > LiF.

Item Type: Article
Uncontrolled Keywords: NiF2 layer; Nickel dissolution; Monovalent fluorides
Subjects: Electroorganic
Depositing User: ttbdar CECRI
Date Deposited: 08 May 2012 08:36
Last Modified: 08 May 2012 08:36

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