Noel, M.
(1999)
Recent investigations on the current status of understanding on the anodic behaviour of nickel in fluoride media.
Bulletin of Electrochemistry , 15 (11).
pp. 466-471.
ISSN 0256-1654
Abstract
In fluoride media, a passive layer of nickel fluoride is easily formed on nickel surfaces during anodic polarisation. This film remains insoluble in liquid HF, non-aqueous fluoride media, low temperature melts and even in HF media containing upto 20% water. In aprotic media, the fluoride film formed is generally uniform. Nucleative processes become quite significant when the acidity is low. Acidity appears to playa significant role in dissolving th oxide layer and enhancing uniform dissolution and precipitation of nickel fluoride. Around 3.0 V, the anodic fluoride fIlm exhibits finite resistivity and allows charge tran fer. The resistivity of the film itself exhibits some potential dependence. The electron transfer probably leads to the formation of high valent NiF2 such as NiF3 or nickel fluoride embedded with free radical fluorine. The voltammetric re ponses in liquid HF, aprotic fluoride media as well as low temperature fluoride melts are being investigated at present.
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