Noel, M. and Suryanarayanan, N. and Suryanarayanan, V. (2001) Electrochemical behaviour of Ni, Cu, Ag, Pt and Glassy-Carbon electrodes in triethylamine-tris (Hydrogen Fluoride) medium. Journal of Solid State Electrochemistry, 5 (6). pp. 419-430. ISSN 1432-8488

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Voltammetric responses of Ni, Cu, Ag, Pt and Glassy-carbon (GC) electrodes in triethylamine-tris (Hydrogen Fluoride) medium in the anodic as well cathodic potential region were investigated. AAS as well as SEM measurements were also made to ascertain the dissolution rate and surface transformation due to fluoride film formation on the electrode surfaces. On Ni, bulk NiF2 film growth occurs only around 4.0 V following a thin NiF2 monolayer formation around 0 V. The NiF2 film shows very little solubility in the medium. Monolayer and bulk CuF2 phases are formed quite close to each other on Cu during anodic polarization. The anodically formed CuF2 dissolves to the extent of 12% in this medium. AgF formation follows a different mechanism during the first and subsequent anodic sweeps. The effect of MeCN as well as water addition on the solubility and stability of these fluoride films are also reported. Glassy carbon Pt electrodes are relatively insert in this medium. Anidic voltammetric responses for other reactive species could be observed only on Pt and GC electrodes. On the cathodic side, all the electrodes show insert behaviour. Electrochemical reduction of PhNO2, for example could be observed on all the electrodes.

Item Type: Article
Uncontrolled Keywords: Triethylamine-tris (Hydro Fluoride); Nickel dissolution; Copper dissolution; Ag dissolution; Fluoride films; Anodic and Cathodic polarization
Subjects: Electroorganic
Depositing User: ttbdu cecri
Date Deposited: 06 Apr 2012 15:52
Last Modified: 06 Apr 2012 15:52

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