Sivakumar, R. and Jayachandran, M. and Sanjeeviraja, C. (2004) Effect of annealing on structural, surface and optical properties of PVD-EBE a-MoO3 thin films for electrochromic devices. Surface Engineering, 20 (5). pp. 385-390. ISSN 0267-0844

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Abstract

Thin films of molybdenum oxide (MoO3) were deposited by a physical vapour deposition method, i.e. the electron beam evaporation technique, using Corning 7059 microscopic glass and SnO2:F as substrates. The effects of annealing temperature on the structural, surface morphological and optical properties of the films were studied and the results are discussed in detail.

Item Type:	Article
Uncontrolled Keywords:	Thin films; Electron beam deposition; Annealing; Optical properties; Energy gap; Surface structure; X-ray diffraction; Crystal structure; Grain size; Semiconductor thin films; Sensors; UV spectroscopy; Molybdenum oxide
Subjects:	Electrochemical Materials Science
Divisions:	UNSPECIFIED
Depositing User:	ttbdu cecri
Date Deposited:	05 Apr 2012 10:58
Last Modified:	05 Apr 2012 10:58
URI:	http://cecri.csircentral.net/id/eprint/1052

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